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Способ раздельного определения сопротивлений образца высокоомного полупроводника и контактов к образцу
The method of separate determination of two-pole sample volume resistance and contact resistance is suggested. The method described is applicable to high-ohmic semiconductor samples: semiinsulating gallium arsenide, detector cadmium-zinc telluride (CZT), etc. The method is based on near-contact region illumination by monochromatic radiation of variable intensity from light emitting diodes with quantum energy exceeding band gap width of investigated material. It is necessary to obtain sample photo-current dependence upon light emitting diode current and to find the straight-line part of this dependence. The extrapolation of this linear part to ordinate axis gives cut-off current value. As bias voltage is known, it is easy to calculate sample volume resistance value. Afterwards, using dark current value, it is possible to determine total contact resistance.