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September 25, 2026
AI Users Earn Up to 41.8% More Than Non-Users
Research conducted by economists at HSE University has revealed a significant correlation between the regular use of GenAI in the workplace and higher pay among Russian employees. The study found that individuals who frequently use GenAI in their professional activities earn notably more than those who reject these new tools or resort to them occasionally. The salary premium for highly qualified specialists reaches 41.8%. The article was published in the Voprosy Ekonomiki journal.
September 24, 2026
‘Feedback and Constructive Criticism Are Essential in Our Profession
Vincent Fardeau, Associate Professor at HSE ICEF, has reached a major career milestone: he recently published his paper ‘Asymmetric Thin Markets’ in the Journal of Financial Economics, successfully passed his major academic review, and received tenure. In this interview, Vincent discusses the story behind the paper, explains the concept of asymmetric thin markets, and shares his advice for young scholars aiming to publish in top-tier journals.
September 22, 2026
Personal Interest in Doctoral Thesis Topic Most Important for Confidence in Successful Defence
A researcher at HSE University analysed data on 1,539 doctoral students from 161 Russian universities to identify which features of a thesis topic are associated with academic success and engagement. The most important factor was found to be personal interest in the research topic, which was associated with almost all key aspects of doctoral programme experience—from engaging with the academic supervisor to research activity and confidence about successfully defending the thesis. The findings have been published in Higher Education.

 

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Micromask Lithography for Cheap and Fast 2D Materials Microstructures Fabrication

Micromachines. 2021. Vol. 12. No. 8. Article 850.
Pugachev M., Duleba A., Arslan A. Galiullin, Aleksandr Y. Kuntsevich

The fast and precise fabrication of micro-devices based on single flakes of novel 2D materials and stacked heterostructures is vital for exploration of novel functionalities. In this paper, we demonstrate a fast high-resolution contact mask lithography through a simple upgrade of metallographic optical microscope. Suggested kit for the micromask lithography is compact and easily compatible with a glove box, thus being suitable for a wide range of air-unstable materials. The shadow masks could be either ordered commercially or fabricated in a laboratory using a beam lithography. The processes of the mask alignment and the resist exposure take a few minutes and provide a micrometer resolution. With the total price of the kit components around USD 200, our approach would be convenient for laboratories with the limited access to commercial lithographic systems.

Research target: Physics Nanotechnologies
Language: English
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Keywords: наноэлектроникаnanoelectronicsфотолитографияlithographyдвумерные материалы 2D materialsVan der waals heterostructuresmask lithographyмасочная литографияВан-дер-Ваальсовы гетероструктуры
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