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Возможности и ограничения метода in situ рентгеновской рефлектометрии для определения параметров растущих пленок

С. 112–114.
Yegorov A. A., Monakhov I., Novoselova E., Smirnov I. S.

The relevance of in situ methods for control of nanoscale films parameters is emphasized . The theoretical basis of the method of in situ X-ray reflectivity is considered. The calculations allowed us to estimate the upper-limit of the film absorption for each X-ray wavelength that restricts possibilities of the method

Language: Russian
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Keywords: рентгеновская рефлектометрия in situинтерферометриявнутрикамерная зондовая микроскопияинтерференционная картинаформула Вульфа-Брэггамагнетронное осаждениедекремент преломленияmagnetron sputteringX-ray reflectivity in-situ

In book

Рентгеновская оптика – 2012. Доклады конференции, г. Черноголовка, 1-4 октября 2012
Рентгеновская оптика – 2012. Доклады конференции, г. Черноголовка, 1-4 октября 2012
Черноголовка: Институт проблем технологии микроэлектроники и особочистых материалов РАН, 2012.
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