A mathematical model of ion and sputtered atom transport in the vicinity of the target with a periodical surface relief in glow discharge in pure gas is developed. Under the assumption that the relief amplitude is small, analytical expressions for their flows are found by the perturbation method and an equation describing the relief amplitude time evolution is derived. It is shown that intensity of sputtering exceeds intensity of sputtered material redeposition at the relief tops, and relief smoothing always takes place in the process of homogeneous target treatment in glow discharge in pure gas.
The scientific program of the conference Ion-Surface Interactions included the main aspects of this scientific discipline: ion scattering and penetration, sputtering and secondary ion emission, electron excitation, ion-induced electron, photon and X-ray emission, ion-assisted processes in thin films and nanostructures, radiation damage accumulation and plasma-surface interactions.
An approximate analytical expression for the ion current density near the cathode in glow discharge is obtained in the presence of a periodic relief of small amplitude and an insulating oxide film of varying thickness on its surface. It is found that ion focusing at the cathode sections with the minimum film thickness, located on any parts of the surface relief, takes place, resulting in an increase of the film thickness non-uniformity with time. Therefore, under the existence of an oxide film on the cathode, its sputtering in glow discharge is determined mainly by the film thickness non-uniformity and not by the surface relief.