The influence of the discharge current axial component on the magnetic field distribution in the cathode region of magnetron sputtering system
The paper includes the description of the mathematical model, which simulates magnetic field distribution in the cathode area of the sputtering system discharge considering the current created by electrons moving along the surface of cathode-target. Presented results of the numerical modeling were received using the developed model. It is also shown that the current component, directed along the cathode surface significantly impacts total magnetic field distribution in the magnetron discharge.
The dynamics of a two-component Davydov-Scott (DS) soliton with a small mismatch of the initial location or velocity of the high-frequency (HF) component was investigated within the framework of the Zakharov-type system of two coupled equations for the HF and low-frequency (LF) fields. In this system, the HF field is described by the linear Schrödinger equation with the potential generated by the LF component varying in time and space. The LF component in this system is described by the Korteweg-de Vries equation with a term of quadratic influence of the HF field on the LF field. The frequency of the DS soliton`s component oscillation was found analytically using the balance equation. The perturbed DS soliton was shown to be stable. The analytical results were confirmed by numerical simulations.
The relevance of in situ methods for control of nanoscale films parameters is emphasized . The theoretical basis of the method of in situ X-ray reflectivity is considered. The calculations allowed us to estimate the upper-limit of the film absorption for each X-ray wavelength that restricts possibilities of the method
At present particular attention is given to techniques which allow the monitoring of single layer and multilayer thin film materials directly during their formation - in-situ methods. Application of these methods helps to ensure a film with desired characteristics, allowing quickly adjust process conditions. The paper describes the possibilities of the in-situ X-ray reflectivity to determine the parameters of nanoscale films in real time of their formation. Experimental results on the magnetron deposition of nanoscale Si films and other materials on silicon substrates are presented.
Experimental results on the Au film deposition on the surface of the nanostructured substrate of sapphire by magnetron sputtering are presented. The surface morphology of the films at different modes of application and its change as a result of the heat treatment were studied by atomic force microscopy.
We present thorough measurements of the intrinsic detection efficiency in the wavelength range from 350 to 2500 nm for meander-type TaN and NbN superconducting nanowire single-photon detectors with different widths of the nanowire. The width varied from 70 nm to 130 nm. The open-beam configuration allowed us to accurately normalize measured spectra and to extract the intrinsic detection efficiency. For detectors from both materials the intrinsic detection efficiency at short wavelengths amounts at 100% and gradually decreases at wavelengths larger than the specific cut-off wavelengths, which decreases with the width of the nanowire. Furthermore, we show that applying weak magnetic fields perpendicular to the meander plane decreases the smallest detectable photon flux.
The possibilities of obtaining ordered gold nanoarrays on sapphire surfaces with oriented nanorelief are demonstrated. The structures are morphologically described using atomic force microscopy data. A study of the angular dependence of the reflectivity in the visible range of electromagnetic waves has revealed some features which are likely to indicate surface plasmon-polariton excitation at the air-gold interface under exposure to p-polarized radiation. The experimental results are found to be in good agreement with the theoretical calculations.
Generalized error-locating codes are discussed. An algorithm for calculation of the upper bound of the probability of erroneous decoding for known code parameters and the input error probability is given. Based on this algorithm, an algorithm for selection of the code parameters for a specified design and input and output error probabilities is constructed. The lower bound of the probability of erroneous decoding is given. Examples of the dependence of the probability of erroneous decoding on the input error probability are given and the behavior of the obtained curves is explained.