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Article

Composition and Surface Structure of Boron-Mixed Graphite Exposed to Oxygen Plasma

Bondarenko G., Gaidar A. I., Petrov V. S., Chernik V. N.

USB15 boronmixed graphite samples subjected to bombardment with 90eV ions of an accelerated oxygen plasma flow are investigated via scanning electron microscopy, Xray microanalysis, Xray diffraction analysis, and mass spectrometry of the thermaldesorption kinetics and volatile compounds. It is revealed that the surface is enriched with oxygen and irradiation is not accompanied by structural changes. The material possesses an imperfect finegrained structure with a very low graphitization level. Thermaldes orption mass spectrometry indicates that spectral lines of boron oxide appear at temperatures of greater than 150°C and reach their maximum at 320–410°C. This corroborates the assumption that an inert boronoxide film is formed on a cold USB15 surface under the action of oxygen ions and evaporates with increasing temperature. The latter leads to a loss in the protective properties of the boron dopant.