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Защитные наноструктурированные пленки нитридов металлов (TiN, ZrN, AlN) и углеродных материалов
The influence of formation conditions on
the composition and structure of nanostructured films of metal nitrides (TiN, ZrN and AlN), diamond
films and diamond-like carbon films is considered. Films of TiN, ZrN and AlN are obtained by arc
discharge and RF-magnetron sputtering methods. Diamond films are grown from the gas mixture of
hydrogen and methane, activated by an arc discharge. Diamond-like carbon films are obtained by RFmagnetron
sputtering methods, a diode RF discharge in a gas mixture of cyclohexane and hydrogen,
and sputtering graphite with an ion beam. The interrelation of the composition and structure of synthesized
films with the mechanical properties of layered structures based on them is investigated.