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Regular version of the site

Book chapter

Получение оптических пленок металлов на установке "плазменный фокус"

С. 67-77.
Колокольцев В. Н., Боровицкая И. В., Ерискин А. А., Никулин В. Я., Силин П. В., Бондаренко Г. Г., Гайдар А. И., Дегтярев В. Ф.
Currently there are many different methods of film deposition on dielectric materials and metal surfaces [1-4], all of them have certain advantages and disadvantages. The main processes for producing thin films are homogeneous method of thermal spraying material, magnetron sputtering methods and chemical and electrolytic deposition. However, after the film deposition to improve their adhesion to the substrate is often necessary to apply chemical and thermal treatment, which leads to uncontrolled changes in their physical properties. Thus, it remains urgent search for alternative methods of film deposition that do not require additional costs for thermal and electro-chemical treatment.   The work for the deposition of thin metal films on dielectric substrates (glass) Installation of Plasma Focus has been used (PF-4) LPI [5]. Previously, it was shown that high-energy plasma beams allow to obtain films on sapphire copper [6, 7]. Thus it observed sufficiently deep penetration of copper into the substrate, thus ensuring a good adhesion of the films. However, sputtered metal films were strongly heterogeneous structure and on the substrate surface were observed significant damage. In this case the optical characteristics of the substrate (sapphire) is significantly worse [8].   The aim of this work was to develop a method of spraying an optically thin metal films on the dielectric substrate (glass).