• A
  • A
  • A
  • ABC
  • ABC
  • ABC
  • А
  • А
  • А
  • А
  • А
Regular version of the site

Article

Применение метода in-situ рентгеновской рефлектометрии для определения параметров наноразмерных пленок кремния

Смирнов И. С., Монахов И. С., Егоров А. А., Новоселова Е. Г.

At present particular attention is given to    techniques  which allow the monitoring of single layer  and multilayer thin film materials   directly during their formation - in-situ methods. Application of these methods helps to ensure a film with desired characteristics, allowing quickly adjust process conditions. The paper describes the possibilities of the in-situ X-ray reflectivity to determine the parameters of nanoscale films in real time of their formation. Experimental results on the magnetron deposition of nanoscale Si films and other materials on silicon substrates  are presented.