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Regular version of the site

Article

Influence of sputtering parameters on the main characteristics of ultrathin vanadium nitride films

Journal of Physics: Conference Series. 2018. No. 1124. P. 1-6.
Золотов Ф. И., Divochiy A., Vakhtomin Y., Lubenchenko A., Morozov P., Shurkaeva I., Smirnov K.

We researched the relation between deposition and ultra-thin VN films parameters.
To conduct the experimental study we varied substrate temperature, Ar and N2 partial pressures
and deposition rate. The study allowed us to obtain the films with close to the bulk values
transition temperatures and implement such samples in order to fabricate superconducting
single-photon detectors