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  • Усиление комбинационного рассеяния света в субволновых плазмонных наноструктурах, полученных методом ионно-лучевой литографии

Article

Усиление комбинационного рассеяния света в субволновых плазмонных наноструктурах, полученных методом ионно-лучевой литографии

Кристаллография. 2014. Т. 59. № 1. С. 137-144.
Смирнов И. С., Мамичев Д., Андреев А., Коновко А., Дрынкин В., Кузнецов И.
By using ion-beam lithography we have obtained subwavelength grating with optimized architecture corresponding to the spectral position of the resonances at desired wavelengths. Structural and optical properties of the obtained nanostructures were investigated. Signal intensity of Raman scattering from molecules of substances adsorbed on the surface gratings with optimized architecture increased to 10 000 times. These nanostructures can be used as a basis for the creation of highly sensitive sensors and a variety of optoelectronic components