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The Influence of Internal Stress on the Nanocrystal Formation of Amorphous Fe73.8Si13B9.1Cu1Nb3.1 Microwires and Ribbons
The early stages of nanocrystallization in amorphous Fe73.8Si13B9.1Cu1Nb3.1 ribbons and
microwires were compared in terms of their internal stress effects. The microstructure was investigated
by the X-ray diffraction method. Classical expressions of crystal nucleation and growth were
modified for microwires while accounting for the internal stress distribution, in order to justify the
XRD data. It was assumed that, due to the strong compressive stresses on the surface part and tensile
stresses on the central part, crystallization on the surface part of the microwire proceeded faster than
in the central part. The results revealed more rapid nanocrystallization in microwires compared to
that in ribbons. During the initial period of annealing, the compressive surface stress of a microwire
caused the formation of a predominantly crystallized surface layer. The results obtained open up
new possibilities for varying the high-frequency properties of microwires and their application in
modern sensorics.