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Dielectric strength of cross-linked thin-film poly(methyl methacrylate)

P. 449–452.
Alexey Ilin, Kovalenko A., Frolov A., Labutov D.

The dielectric strength of thin-film cross-linked PMMA was studied. A series of samples was fabricated using EBL. The samples were two overlapping Pd electrodes separated by a layer of cross-linked PMMA. The cross-linking was obtained by high-dose electron-beam irradiation of PMMA thin-film. The size of the overlap was 1×1 μm2 and the crosslinked PMMA layer thickness was 90 nm. The IV characteristics of the samples were obtained, and the breakdown voltage measured was 32.5 V to 46.6 V with mean value 39.2 V, and median 38.9 V. The calculated dielectric strength of the thin-film cross-linked PMMA was 3.6 MV/cm to 5.2 MV/cm, with mean value 4.4 MV/cm and median 4.3 MV/cm. Additionally, PMMA thin films shrinkage under cross-linking was measured.

Language: English
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Keywords: Electron beam lithographyPMMAcross-linked PMMAXPMMAdielectric strengthbreakdown voltage

In book

2021 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)
2021 IEEE International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO)
IEEE, 2021.
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Added: September 29, 2020
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