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August 25, 2026
Scientists Develop Algorithm for More Reliable Processors in Data Centres
Researchers from HSE MIEM and Samara University have developed the LRF-3D algorithm to automatically bypass idle nodes in three-dimensional networks-on-chip. Thanks to its hierarchical architecture, the algorithm outperforms existing solutions in both speed and path accuracy, improving processor reliability for use in data centres, supercomputers, and AI computing. The source code and test results are publicly available.
August 24, 2026
Researchers Develop Method for Direct Generation of Regulatory DNA
Researchers at HSE University have developed a model for generating promoters and enhancers—DNA sequences that regulate gene activity. The model works directly with DNA nucleotides, without first transforming them into a continuous numerical representation. This solution could be useful for applications in synthetic biology and gene therapy. The study results were presented at the ICLR 2026 Workshop ‘Generative AI in Genomics (Gen^2): Barriers and Frontiers.’
August 21, 2026
Social Integration: At the Crossroads of Knowledge and Values
The International Laboratory for Social Integration Research (ILSIR) at HSE University studies the challenges faced by vulnerable groups and explores ways to help them participate fully in everyday life. To develop effective solutions, the laboratory’s researchers combine cutting-edge methods with practical fieldwork. In this interview with the HSE News Service, Laboratory Head Elena Iarskaia-Smirnova discusses the laboratory’s work.

 

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Принятие технического решения из ряда недоминируемых альтернатив при разработке литографических процессов

С. 265–265.
Корпачев М. Ю.
Language: Russian
Full text
Keywords: литографические процессыСистемы поддержки и принятия технических решенийалгоритм выбора технического решения в литографической технологии

In book

Научно-техническая конференция студентов, аспирантов и молодых специалистов МИЭМ НИУ ВШЭ. Тезисы докладов
Научно-техническая конференция студентов, аспирантов и молодых специалистов МИЭМ НИУ ВШЭ. Тезисы докладов
М.: МИЭМ НИУ ВШЭ, 2013.
Similar publications
Технология литографических процессов
Lapshinov B. A., М.: Московский государственный институт электроники и математики, 2011.
Изложены принципы и методы выполнения всех операций, составляющих единый технологический процесс фотолитографии. Дан анализ ограничений разрешающей способности традиционной фотолитографии и показаны пути их преодоления. Приведены сведения о развитии литографических процессов и основные принципы их реализации. Для студентов 3 и 4 курсов обучающихся по специальности 210100 «Электронное машиностроение». ...
Added: April 23, 2012
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