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Deposition of optically transparent copper films on dielectric substrates using the plasma focus installation

P. 971–974.
Kolokoltsev V. N., Borovitskaya I. V., Nikulin V. Y., Silin P. V., Bondarenko G.G., Degtyarev B. F.

In  this work it has been obtained an uniform optically transparent copper films on silicate glass substrates using
ablation of the copper anode at the Plasma focus facility.facility

Language: English
Full text
DOI
Keywords: copper filmsустановка "Плазменный фокус"silicate glassPlasma focus facilityмедные пленкисиликатное стекло

In book

Proceedings of 2020 7th International Congress on Energy Fluxes and Radiation Effects, EFRE 2020
Tomsk: IEEE, 2020.
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