Quasi-3D TCAD modeling of STI radiation-induced leakage currents in SOI MOSFET structure
Quasi-3D model for calculation of radiation leakage currents in modern submicron SOI MOSFET structures is proposed. Instead of the fully 3D modeling is proposed to solve two tasks: 2D modeling of the traditional MOSFET cross-section and 3D modeling of the side parasitic transistor. The radiation-induced leakage current simulation in the 0.35 μm SOI MOSFET structure with taking account ionizing radiation with a dose of up to 500 krad was simulated. The results of the simulation show that in comparison with the traditional fully 3D modeling, which requires 11 hours of computer time, the computer time for the IdVg characteristic was reduced to 71 minutes (i.e. the computer time decreased by 9 times).