The damage features of the vanadium surface layer under the action of pulsed laser radiation are investigated. Laser irradiation of the samples was carried out in air using the GOS 1001 installation in the modulated q-factor mode with a flux density q equal to 1.2 × 108 W / cm2, pulse duration τ0 = 50 ns, the number of pulses N from 1 to 6. It is shown that the typical surface damage is melting of the material, formation of the grid of microcracks, formation of wave-like relief and drip structures. The central zone is characterized by the highest degree of damage, where along with the above mentioned damage there are individual drops of metal that are crystallized like a spiral. The zone of thermal influence adjacent to the central zone of irradiation is damaged much weaker and the degradation of the surface increases with the increase in the number of laser pulses. As a result of laser processing, along with the change in the topography of the material surface, changes in the diffractograms of samples were also observed: the texture weakens, the peaks become wider, the lattice period increases (3.022 – before irradiation, 3.027 after irradiation). It was found that the preliminary argon ions (dose 1022 m-2, E = 20 keV) irradiation of samples practically does not affect the nature of surface damage in the central zone after laser treatment, whereas in the adjacent zone of thermal influence there is a break of local surface areas.
Changes in the morphology of the vanadium surface as a result of separate and sequential action of helium ions (energy-30 Kev, dose - 1.0 × 1022 m-2 , ion flux density – 4,8 × 1018 m-2 s-1 , temperature ~ 500 K ) and high-power pulsed laser radiation in the modulated q-factor mode (power density q = 1.2•108 W/cm2, pulse duration τ0 = 50 ns, the number of pulses N from 1 to 4) were investigated. It was found that the effect of laser irradiation on vanadium samples before and after ion implantation is identical (the formation of a hole surrounded by a breastwork, which occurred during the splash of molten metal), but in the case of preliminary introduction of helium into the material, the metal splash is more intense. Helium implantation into the samples causes radiation blistering, and the subsequent impact of laser pulses increases the erosion of the material in the zone located directly behind the hole (an increase in the number of exfoliated layers, the merger of blisters, etc.), which is due to sufficiently high temperatures in this area even after the termination of the laser pulse. Under real reactor conditions, this can lead to an increase of plasma contamination.