Damage of Al2O3 Ceramics under the Action of Pulsed Ion and Plasma Fluxes and Laser Irradiation
Alumina ceramics with corundum structure (α-Аl2О3) manufactured by powder technology method was irradiated by pulsed ion beams and high-temperature plasma in Plasma Focus device and by free running mode laser radiation. Irradiation in the PF-5M device was carried out with nitrogen and air working gases with power flux density for the plasma flow q ≈ 107 W/cm2 and pulse duration τp ≈ 100 ns, and for ion flow q ≈ 108 W/cm2, τi ≈ 20 ns. Exposure with pulsed laser radiation was carried out in air with q ≈ (3 – 5)105 W/cm2 and τ ≈ 0.7 ms. The features of erosion (weight loss) and the damage of the surface layer of ceramics for these modes of exposure were investigated. It has been shown that the joint use of Plasma Focus and pulsed laser exposure is promising for simulation of extreme processes of damage and erosion of materials in thermonuclear fusion reactor (such as ELMs effects in the reactor Iter or at the first wall of the chambers with inertial plasma confinement) in order to study and predict their behavior under these conditions.
The method of Rutherford back scattering of He + ions with 2 MeV studied the distribution profiles of the elements C, Cu and W in the films deposited on the discharge installation type "plasma focus". The films are deposited on glass substrates in Ar plasma-forming gas. It is found that the element distribution profiles vary significantly from the kinetic energy of the particles. Particles having a velocity about 105 m / s, penetrates to a depth of about 1.5 microns. Appropriate distribution profiles elements for glass thickness are nonlinear. For each element, there is a maximum depth of the layer under the surface of the glass. A feature of the films obtained on the setting of "plasma-focus" is the formation of layers of the elements Cu, W and C at the glass surface and their mutual overlap. This arrangement of layers distinguishes described film deposition method of the commonly used methods of application at low speeds the deposition of atoms, as well as by diffusion. It is found that the obtained film are insulators.
The work carried out research on the use of pulsed high-temperature plasma for the preparation of compounds of immiscible materials. The technique of irradiation on materials installation type Plasma Focus.
There are many different methods of deposition of films on the dielectric material and the metal surface , such as magnetron sputtering and thermal materials , methods, and electrolytic chemical deposition , etc. However , after the film deposition to improve their adhesion to the substrate is necessary to apply chemical and thermal treatment, which often leads to uncontrolled changes in the physical properties of the films . Thus, the search for alternative methods of deposition of films that do not require additional costs for thermal and galvanic chemical treatment remains valid . This paper proposes a method of applying metallic films on glass substrates using pulsed plasma obtained by installing a Plasma Focus ; describe a scheme of the experiment and the results of investigations of the obtained films.
The paper investigated the redistribution of hydrogen and deuterium in the assemblies of metallic foils Ta | CD2 | Ta, Ta | Ta | CD2 | Ta | Ta and Nb | CD2 | Nb, irradiated pulses of high-argon plasma at a plasma focus. Irradiated samples foils were investigated by detection of recoil nuclei of hydrogen and deuterium (ERDA). It found ultradeep penetration in the target light gas impurities (hydrogen and deuterium). It is assumed that this phenomenon is due to the influence of shock waves generated by a plasma pulse, and acceleration of diffusion processes.
The paper provides a number of proposed draft operational guidelines for technology measurement and includes a number of tentative technology definitions to be used for statistical purposes, principles for identification and classification of potentially growing technology areas, suggestions on the survey strategies and indicators. These are the key components of an internationally harmonized framework for collecting and interpreting technology data that would need to be further developed through a broader consultation process. A summary of definitions of technology already available in OECD manuals and the stocktaking results are provided in the Annex section.